1.

Conference Proceedings
Conference Proceedings
1. DUV printability of laser repairs on binary and attenuated phase-shift masks
Reynolds,J.A. ; Schellenberg,F.M. ; Hibbs,M.S. ; Hayden,D.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.312-323,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing
Hibbs,M.S. ; Ushida,M. ; Babich,K. ; Mitsui,H. ; Bourov,A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.444-451,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
Chey,S.J. ; Guarnieri,C.R. ; Babich,K. ; Pope,K.R. ; Goldfarb,D. ; Angelopoulos,M. ; Racette,K.C. ; Hibbs,M.S. ; Gibson,M.L. ; Kimmel,K.R.
Pub. info.: Optical Microlithography XIV.  4346  pp.798-805,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Optimum mask and source patterns to print a given shape
Rosenbluth,A.E. ; Bukofsky,S.J. ; Hibbs,M.S. ; Lai,K. ; Molless,A.F. ; Singh,R.N. ; Wong,A.K.
Pub. info.: Optical Microlithography XIV.  4346  pp.486-502,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346