Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.415-422, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Heumann, J.P. ; Zarrabian, M. ; Hennig, M. ; Dettmann, W. ; Zurbrick, L.S. ; Lang, M.
Pub. info.:
22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1033-1040, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology IX. pp.511-516, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Griesinger, U.A. ; Dettmann, W. ; Hennig, M. ; Heumann, J.P. ; Koehle, R. ; Ludwig, R. ; Verbeek, M. ; Zarrabian, M.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.410-421, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Heumann, J.P. ; Schurack, F. ; Dettmann, W. ; Zurbrick, L. ; Lang, M.
Pub. info.:
Metrology, Inspection, and Process Control for Microlithography XVIII. pp.346-354, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering