1.

Conference Proceedings
Conference Proceedings
1. Review and Experimental Analysis of Oxide CMP Models
Stein, David J. ; Hetherington, Dale L.
Pub. info.: Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium.  pp.217-233,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-37
2.

Conference Proceedings
Conference Proceedings
2. Improved polysilicon surface-micromachined micromirror devices using chemical-mechanical polishing
Hetherington, Dale L. ; Sniegowski, Jeffry J.
Pub. info.: Photonics for space environments VI : 22 July 1998, San Diego, California.  pp.148-153,  1998.  Bellingham, Wash..  SPIE
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3440
3.

Conference Proceedings
Conference Proceedings
3. Polyurethane Pad Degradation and Wear Due to Tungsten and Oxide CMP
Moy, Amy L. ; Cecchi, Joseph L. ; Hetherington, Dale L. ; Stein, David J.
Pub. info.: Chemical-mechanical polishing 2001 -- advances and future challenges : symposium held April 18-20, 2001, San Francisco, California, U.S.A..  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 671