1.

Conference Proceedings
Conference Proceedings
1. Reduction of De-ionized Water Usage in Photoresist Stripping Processes
Kamal, T. ; Hess, D.W.
Pub. info.: Environmental issues in the electronics and semiconductor industries : proceedings of the third international symposium.  pp.133-142,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-7
2.

Conference Proceedings
Conference Proceedings
2. REACTION OF 1,1,1,5,5,5,-HEXAFLUORO-2.4-PENTANEDIONE (hfac) WITH SURFACES OF CuO, Cu2O, AND Cu STUDIED BY XPS
George, M.A. ; Hess, D.W. ; Beck, S.E. ; Ivankovits, J.C. ; Bohling, D.A. ; Felker, B.S. ; Lane, A.P.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.272-280,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
3.

Conference Proceedings
Conference Proceedings
3. REMOVAL OF NOVOLAC-BASED PHOTORESIST FILM USING LOW MOLECULAR WEIGHT ALCOHOLS
Kamal, T. ; Hess, D.W.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.235-243,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
4.

Conference Proceedings
Conference Proceedings
4. DEPOSITION OF TITANIUM NITRIDE THIN FILMS BY PLASMA ENCHANCED CVD AND REACTIVE SPUTTERING
Gleason, E.F. ; Hess, D.W.
Pub. info.: Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A..  pp.343-350,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 68
5.

Conference Proceedings
Conference Proceedings
5. Plasma-Assisted Oxidation And Nitridation Of Silicon
Hess, D.W.
Pub. info.: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.229-243,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-16
6.

Conference Proceedings
Conference Proceedings
6. DEPOSITION CHEMISTRY AND STRUCTURE OF AMORPHOUS FLUORINATED SILICON NITRIDE
Petrich, M.A. ; Livengood, R.E. ; Hess, D.W. ; Reimer, J.A.
Pub. info.: Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A..  pp.67-72,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 118
7.

Conference Proceedings
Conference Proceedings
7. Oxidation of Silicon in Halogenated Atmospheres and Oxidation of Heavily Doped Silicon: Analysis by the Deal-Grove Model
Hess, D.W.
Pub. info.: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.143-161,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-1
8.

Conference Proceedings
Conference Proceedings
8. In-Situ Measurements of Heat Effects and Radia- tion Damage in Plasma-Assisted Etching
Hess, D.W.
Pub. info.: Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control.  pp.1-12,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-21
9.

Conference Proceedings
Conference Proceedings
9. Investigation of Reactions of 1,1,1,5,5, 5-Hexafluoro-2,4-Pentanedione (hfac) with Thin Films of CuO and Cu2O
George, M.A. ; Hess, D.W. ; Beck, S.E. ; Ivankovits, J.C. ; Bohling, D.A. ; Felker, B.S. ; Lane, A.P.
Pub. info.: AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California.  1994.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1994
10.

Conference Proceedings
Conference Proceedings
10. Copper Patterning Using Plasma Oxidation or Anodization
Li, Y. ; Hess, D.W.
Pub. info.: Thin film materials, processes, and reliability : proceedings of the international symposium.  pp.204-210,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-24