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17 results

Conference Proceedings

1. REMOVAL OF Cu FROM Si WAFER SURFACES USING DILUTE HF-HC1 SOLUTIONS

Dhanda, S. ; Chiarello, R.P. ; Helms, C.R. ; Gupta, P.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.136-142, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

2. ELLIPSOMETRIC MODEL STUDY ON HF ETCHED SILICON

Fang, S.S.J. ; Helms, C.R.

Pub. info.:	Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III. pp.267-276, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-9

Conference Proceedings

3. COMPARISON OF DIFFUSION AND CONVECTION IN AQUEOUS CLEANING TOOLS

Helms, C.R.

Pub. info.:	Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III. pp.222-227, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-9

Conference Proceedings

4. Fe REMOVAL IN SC2 SOLUTIONS

Dhanda, S. ; Chiarello, R.P. ; Helms, C.R. ; Gupta, P.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.113-119, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

5. Effect of Trace Amounts of Al Surface Contamination on Oxidation Growth Kinetics of Ultrathin Gate Oxides

Chiarello, R.P. ; Liao, H. ; Helms, C.R. ; Craig, S.

Pub. info.:	Proceedings of the Fifth International Symposium on High Purity Silicon V. pp.264-271, 1998. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	98-13

Conference Proceedings

6. Modeling of Diffusion and Ion Implantation in Mercury Cadium Telluride: A Comparison to Transient Enhanced Diffusion in Silicon

Hollander-Gleixner, S. ; Robinson, H.G. ; Williams, B.L. ; Mao, D.H. ; Yu, I.F. ; Helms, C.R.

Pub. info.:	Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.216-227, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-4

Conference Proceedings

7. THE INTERACTION OFCF3+ AND CH4+ WITH SiO2 SURFACES

Thomson, D.J. ; Helms, C.R.

Pub. info.:	Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.. pp.441-446, 1986. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	68

Conference Proceedings

8. INVITED: REALIZING THE FUTURE FOR THE SEMICONDUCTOR INDUSTRY-MEETING THE CHALLENGES OF PROCESS, DESIGN, AND BUSINESS

Melliar-Smith, C.M. ; Helms, C.R.

Pub. info.:	Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.20-37, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-2

Conference Proceedings

9. DIRECT OBSERVATION OF THE EFFECTS OF LOW ENERGY OXYGEN ION BOMBARDMENT TO DAMAGED AND UNDAMAGED DIAMOND SURFACES

Beerling, T.E. ; Helms, C.R.

Pub. info.:	Proceedings of the Third International Symposium on Diamond Materials. pp.572-579, 1993. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-17

10.

Conference Proceedings

10. *PRESENT AND EMERGIN TECHNIQUES FOR MATERIALS MICROANALYSIS

Helms, C.R.

Pub. info.:	Materials characterization : symposium held April 15-17, 1986, Palo Alto California, U.S.A.. pp.3-14, 1986. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	69

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