1.

Conference Proceedings
Conference Proceedings
1. Plasma-Enhanced MOCVD of Smooth Nanometersized Metal/Silicon Single- and Multilayerfilms
Hamelmann, F ; Haindl, O. ; Aschentrup, A. ; Klipp, A. ; Kleineberg, U. ; Juizi, P. ; Heinzmann, U.
Pub. info.: CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition.  pp.131-139,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-13
2.

Conference Proceedings
Conference Proceedings
2. Plasma assisted deposition of tungsten oxide/silicon oxide multilayer films with sub-nanometer single layers
Hamelmann, F. ; Wonisch, H. ; Heinzmann, U.
Pub. info.: Functional properties of nanostructured materials.  pp.351-355,  2006.  Dordrecht.  Springer
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 223
3.

Conference Proceedings
Conference Proceedings
3. Metal/Silicon Multilayers Produced by Low-Temperature MOCVD
Hamelmann, F. ; Haindl, G. ; Klipp, A. ; Majkova, E. ; Kleineberg, U. ; Jutzi, P. ; Heinzmann, U.
Pub. info.: Properties and processing of vapor-deposited coatings : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A..  pp.19-,  1999.  Warrendale, PA..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 555
4.

Conference Proceedings
Conference Proceedings
4. Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications
Hamelmann, F. ; Hachmann, W. ; Wonisch, A. ; Heinzmann, U. ; Ivanovo, T. ; Gesheva, K.
Pub. info.: EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium.  pp.433-440,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-09
5.

Conference Proceedings
Conference Proceedings
5. Technology and characterization of CVD-grown mixed Mo/W Oxide films and electrochromic devices made on their basis
Gesheva, K. A. ; Ivanovo, T. ; Steinman, E. ; Hamelmann, F. ; Brechling, A. ; Heinzmann, U.
Pub. info.: EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium.  pp.799-809,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-09
6.

Conference Proceedings
Conference Proceedings
6. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonyle Pentaisonitrile in a Remote Plasma Reactor
Hamelmann, F. ; Brechling, A. ; Aschentrup, A. ; Heinzmann, U. ; Jutzi, P. ; Sandrock, J. ; Siemeling, U.
Pub. info.: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium.  pp.954-594,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-8
7.

Conference Proceedings
Conference Proceedings
7. Effect of Ion-Beam Polishing on the Interface Quality in a Ti/C Multilayer Mirror for 'Water Window'
Jergel, M. ; Holy, V. ; Majkova, E. ; Luby, S. ; Senderak, R. ; Stock, H. J. ; Menke, D. ; Kleineberg, U. ; Heinzmann, U.
Pub. info.: EPDIC 6 : proceedings of the sixth European Powder Diffraction Conference, held August 22-25, 1998 in Budapest, Hungary.  pp.184-191,  2000.  Zuerich-Uetikon, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 321-324(1)
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Conference Proceedings
Conference Proceedings
8. Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy [6151-73]
Kleineberg, U. ; Lin, J. ; Neuhaeusler, U. ; Heinzmann, U. ; Weber, N. ; Escher, M ; Merkel, M. ; Oelsner, A. ; Valsaitsev, D. ; Schoenhense, G.
Pub. info.: Emerging Lithographic Technologies X.  pp.615120-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151