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19 results

Conference Proceedings

1. Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Davis,M.J. ; Marker Ⅲ,A.J. ; Aschke,L. ; Schubert,F. ; Moersen,E. ; Kohlmann,H. ; Mitra,I. ; Alkemper,J. ; Muller,R.W. ; Taylor,J.S. ; Blaedel,K.L. ; Hector,S.D.

Pub. info.:	Inorganic optical materials III : 2 August, 2001, San Diego, USA. pp.100-106, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4452

Conference Proceedings

2. Bremsstrahlung emission and absorption in electron projection lithography

Hector,S.D. ; Cobb,J.L. ; Ivin,V. ; Silakov,M.V. ; Babushkin,G.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.95-106, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

3. Mask substrate requirements and development for extreme ultraviolet lithography(EUVL)

Tong,W.M. ; Taylor,J.S. ; Hector,S.D. ; Shell,M.K

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.421-428, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Comparison of at-wavelength inspection,printability,and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography(EUVL)

Cardinale,G.F. ; Goldsmith,J.E.M. ; Ray-Chaudhuri,A.K. ; Fisher,A. ; Hector,S.D. ; Mangat,P.J.S. ; Masnyj,Z.S. ; Mancini,D.P. ; Wilkinson,B. ; Bokor,J. ; Jeong,S. ; Burkhart,S.C. ; Cerjan,C.J. ; Walton,C.C. ; Yan,P. ; Zhang,C.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.429-439, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

5. EUV mask fabrication using Be-based multilayer mirrors

Mangat,P.J. ; Wasson,J.R. ; Hector,S.D. ; Cardinale,G.F. ; Bajt,S.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.814-818, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Thermal management of EUV lithography masks using low-expansion glass substrates

Gianoulakis,S.E. ; Ray-Chaudhuri,A.K. ; Hector,S.D.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.598-605, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

7. Simulation of x-ray mask defect printability

Bollepalli,B.S. ; Hector,S.D. ; Maldonado,J.R. ; Leavey,J.A. ; Cerrina,F. ; Khan,M.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.155-166, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

Conference Proceedings

8. EUVL printing results of a low-thermal expansion material(LTEM)mask

Tong,W.M. ; Taylor,J.S. ; Hector,S.D. ; Shell,M.M. ; Zhang,G. ; Kearney,P.A. ; Walton,C.C. ; Larson,C. ; Wasson,J.R. ; Mangat,P.J. ; O'Connell,D.J. ; Folk,D.R.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.855-860, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

9. EUV mask fabrication with Cr absorber

Mangnat,P.J. ; Hector,S.D. ; Rose,S. ; Cardinale,G.F. ; Tenjil,E. ; Stivers,A.R.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.76-82, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

10.

Conference Proceedings

10. Infinitely selective repair buffer for EUVL reticles

Wasson,J.R. ; Smith,K.H. ; Mangat,P.J.S. ; Hector,S.D.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.402-408, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

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