1.

Conference Proceedings
Conference Proceedings
1. Rigorous EUV mask simulator using 2D and 3D waveguide methods
Zhu, Z. ; Lucas, K. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.494-503,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
Han, S.-I. ; Weisbrod, E. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.314-330,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Vendor capability for low-thermal-expansion mask substrates for EUV lithography
Blaedel, K.L. ; Taylor, J.S. ; Hector, S.D. ; Yan, P.Y. ; Ramamoorthy, A. ; Brooker, P.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.767-778,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. EUVL masks: requirements and potential solutions (Invited Paper)
Hector, S.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.134-149,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
5.

Conference Proceedings
Conference Proceedings
5. Integration of UTR processes into MPU IC manufacturing flows
Cobb, J.L. ; Dakshina-Murthy, S. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. ; Peters, R.D. ; Wu, W. ; Hector, S.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.277-286,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
6.

Conference Proceedings
Conference Proceedings
6. Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
Han, S.-I. ; Wasson, J.R. ; Mangat, P.J.S. ; Cobb, J.L. ; Lucas, K. ; Hector, S.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.481-494,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
7.

Conference Proceedings
Conference Proceedings
7. EUVL mask challenges and how International SEMATECH is addressing them
Hector, S.D. ; Kemp, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.792-803,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
8.

Conference Proceedings
Conference Proceedings
8. EUVL mask blank repair
Barty, A. ; Mirkarimi, P.B. ; Stearns, D.G. ; Sweeney, D.W. ; Chapman, H.N. ; Clift, M. ; Hector, S.D. ; Yi, M.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.385-394,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
9.

Conference Proceedings
Conference Proceedings
9. Inspection of EUV reticles
Pettibone, D.W. ; Veldman, A. ; Liang, T. ; Stivers, A.R. ; Mangat, P.J. ; Lu, B. ; Hector, S.D. ; Wasson, J.R. ; Bleadel, K.L. ; Fisch, E. ; Walker, D.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.363-374,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
10.

Conference Proceedings
Conference Proceedings
10. Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets
Hector, S.D. ; Postnikov, S.V. ; Cobb, J.
Pub. info.: Optical Microlithography XVII.  pp.555-570,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377