1.

Conference Proceedings
Conference Proceedings
1. Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs
Srivastava, A. ; Osburn, C.M. ; Yee, K.F. ; Heinisch, H.H. ; Vogel, E.M ; Abmed, K.Z. ; Wang, Z. ; Min, K. ; TimberJoke, B. ; Parker, C. ; Worimnan, J.J. ; Hauser, J.R.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.81-88,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
2.

Conference Proceedings
Conference Proceedings
2. CLUSTER TOOLS-HARDWARE AND PROCESS INTEGRATION
Hauser, J.R.
Pub. info.: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.265-276,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-10
3.

Conference Proceedings
Conference Proceedings
3. Effect of Fermi Level Position of Polysilicon Gate on the Flatband Voltage Shift for Ultrathin Oxide-Nitride Gate Stacks
Wang, Z. ; Hodge, D.W. ; Croswell, R.T. ; Hauser, J.R.
Pub. info.: The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000.  pp.145-152,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-2
4.

Conference Proceedings
Conference Proceedings
4. Characterization of Ultrathin Oxide Interfaces (Tox <1 nm) in Oxide-Nitride Stack Formed by Remote Plasma Enhanced Chemical Vapor Deposition
Wang, Z. ; Wang, S. ; Young, W.Li ; Croswell, R.T. ; Hauser, J.R.
Pub. info.: The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000.  pp.209-216,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-2
5.

Conference Proceedings
Conference Proceedings
5. HYDROGEN PLASMA CLEANING PRIOR TO LOW TEMPERATURE GATE OXIDE DEPOSITION IN CLUSTER FABRICATED MOSFETs
Montgomery, J.S. ; Barnak, J.P. ; Bayoumi, A. ; Hauser, J.R. ; Nemanich, R.J.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.296-306,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
6.

Conference Proceedings
Conference Proceedings
6. THE ROLE OF OXIDE IMPURITIES IN SURFACE RESIDUE NUCLEATION DUE TO ANHYDROUS HF/METHANOL VAPOR PHASE CLEANING
Carter, R.J. ; Hauser, J.R. ; Nemanich, R.J.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.137-144,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36