1.

Conference Proceedings
Conference Proceedings
1. New High Loaded White Concentrates
Hattori, K.
Pub. info.: In search of excellence : conference proceedings : ANTEC '91, Montreal.  pp.12-14,  1991.  Brookfield Center, CT.  Society of Plastics Engineers, Inc. (SPE)
Title of ser.: Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.: 37
2.

Conference Proceedings
Conference Proceedings
2. Residue-free Etching of Al-Si-Cu Alloys Employing Magnetron RIE
Hattori, K. ; Hori, M. ; Aoyama, M.
Pub. info.: Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control.  pp.264-274,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-21
3.

Conference Proceedings
Conference Proceedings
3. * TOWARD 20% EFFICIENCY WITH a-Si // POLY-Si TANDEM SOLAR CELL
Yoshimi, M. ; Ma, W. ; Horiuchi, T. ; Lim, C.C. ; De, S.C. ; Hattori, K. ; Okamoto, H. ; Hamakawa, Y.
Pub. info.: Amorphous silicon technology, 1992.  pp.845-856,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 258
4.

Conference Proceedings
Conference Proceedings
4. OPTICAL OBSERVATION OF QUANTUM-SIZE EFFECT IN THE AMORPHOUS SILICON/AMORPHOUS SILICON CARBIDE MULTILAYER
Hattori, K. ; Mori, T. ; Okamoto, H. ; Hamakawa, Y.
Pub. info.: Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A..  pp.355-360,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 118
5.

Conference Proceedings
Conference Proceedings
5. Photoinduced Structural Changes in Hydrogenated Amorphous Silicon
Shimizu, K. ; Tabuchi, T. ; Hattori, K. ; Kida, H. ; Okamoto, H.
Pub. info.: Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A..  pp.735-,  1999.  Warrendale.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 507
6.

Conference Proceedings
Conference Proceedings
6. Dissolution behavior of resist polymers studied using quartz crystal microbalance method
Kono, Y. ; Sekiguchi, A. ; Hirai, Y. ; Arasaki, S. ; Hattori, K.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.302-308,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
7.

Technical Paper
Technical Paper
7. Simultaneous Reduction of NOX and Soot in a Heavy-Duty Diesel Engine by Instantaneous Mixing of Fuel and Water.
Murotani, T. ; Hattori, K. ; Sato, E. ; Chryssakis, C. ; Babajimopoulos, A
Pub. info.: 2007 SAE world congress : technical paper.  2007.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2007
8.

Technical Paper
Technical Paper
8. Development of Ratio Control System for Toyota's New Continuously Variable Transmission.
Hattori, K. ; Toyoda, S.
Pub. info.: 2013 SAE world congress : technical paper.  2013.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2013
9.

Conference Proceedings
Conference Proceedings
9. Solution for 100-nm: EBM-4000
Hattori, Y. ; Hattori, K. ; Murooka, K. ; Abe, T. ; Yasuda, S. ; Uno, T. ; Murakami, E. ; Nakayamada, N. ; Shimomura, N. ; Yamashita, T. ; Yamada, N. ; Sakai, A. ; Honda, H. ; Shimoyama, T. ; Nakaso, K. ; Inoue, H. ; Onimaru, Y. ; Makiyama, K. ; Ogawa, Y. ; Takigawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.697-704,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
10.

Conference Proceedings
Conference Proceedings
10. Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Tojo, T. ; Yoshikawa, R. ; Ogawa, Y. ; Tamamushi, S. ; Hattori, Y. ; Koikari, S. ; Kusakabe, H. ; Abe, T. ; Ogasawara, M. ; Akeno, K. ; Anze, H. ; Hattori, K. ; Hirano, R. ; Yoshitake, S. ; Iijima, T. ; Ohtoshi, K. ; Matsuki, K. ; Shimomura, N. ; Yamada, N. ; Higurashi, H. ; Nakayamada, N. ; Fukudome, Y. ; Hara, S. ; Murakami, E. ; Kamikubo, T. ; Suzuki, Y. ; Oogi, S. ; Shimizu, M. ; Nishimura, S. ; Tsurumaki, H. ; Yasuda, S. ; Ooki, K. ; Koyama, K. ; Watanabe, S. ; Yano, M. ; Suzuki, H. ; Hoshino, H. ; Toriumi, M. ; Watanabe, O. ; Tsuji, K. ; Katayama, M. ; Tsuchiya, S. ; Suzuki, K. ; Kurasawa, S. ; Okuzono, K. ; Yamada, H. ; Handa, K. ; Suzuki, Y. ; Akiyama, T. ; Tada, Y. ; Noma, A. ; Takigawa, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.416-425,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748