1.

Conference Proceedings
Conference Proceedings
1. Accurate proximity correction method with total-process proximity-based correction factor(TCF)
Hashimoto,K. ; Usui,S. ; Hasebe,S. ; Murota,M. ; Nakayama,T. ; Matsuoka,F. ; Inoue,S. ; Kobayashi,S. ; Yamamoto,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.224-233,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask
Hirooka,S. ; Hasebe,S. ; Tsutsui,T. ; Nojima,S. ; Aoyama,H. ; Watanabe,H.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.344-353,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096