Kitamura, T. ; Kubota, K. ; Hasebe, T. ; Sakai, F. ; Nakazawa, S. ; Vohra, N. ; Yamamoto, M. ; Inoue, M.
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Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.73-84, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Mizukami, K. ; Hasebe, T. ; Katayama, T. ; Nakamura, Y. ; Imaida, Y.
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Explosion, shock wave and hypervelocity phenomena in materials : proceedings of the 1st International Symposium on Explosion, Shock Wave and Hypervelocity Phenomena in Materials(ESHP Symposium), 15-17 March 2004, Kumamoto, Japan. pp.43-48, 2004. Zuerich. Trans Tech Publications
Sugihara, M. ; Takata, T. ; Nakamura, K. ; Inanami, R. ; Hayashi, H. ; Kishimoto, K. ; Hasebe, T. ; Kawano, Y. ; Matsunaga, Y. ; Murakami, K. ; Okumura, K.
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Emerging Lithographic Technologies X. pp.61510Z-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Tsuneoka, M. ; Hasebe, T. ; Tokumoto, T. ; Yan, C. ; Yamamoto, M. ; Resnick, D. J. ; Thompson, E. ; Wakamori, H. ; lnoue, M. ; Ainley, E. ; Nordquist, K. J. ; Dauksher, W. J.
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Photomask Technology 2006. pp.63492D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Kitamura, T. ; Kubota, K. ; Hasebe, T. ; Sakai, F. ; Nakazawa, S. ; Vohra, N. ; Yamamoto, M. ; Inoue, M.
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Photomask and Next-Generation Lithography Mask Technology XII. pp.988-999, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering