1.

Conference Proceedings
Conference Proceedings
1. Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator
Sjoberg, H. ; Chauvet, J.-M. ; Harkesjo, J. ; Hogfeldt, P. ; Karawajczyk, A. ; Karlsson, J. ; Kjellberg, L. ; Mahlen, J. ; Beyerl, A. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M. ; Aman, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.632-642,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
Aman, J. ; Fosshaug, H.A. ; Hedqvist, T. ; Harkesjo, J. ; Hogfeldt, P. ; Jacobsson, M. ; Karawajczyk, A. ; Karlsson, J. ; Rosling, M. ; Sjoberg, H.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.684-694,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256