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49 results

Conference Proceedings

1. Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing [5853-19]

Kim, S.-K. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.425-431, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

2. Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]

Ki, W.-T. ; Ahn, B.-S. ; Park, J.-S. ; Choi, S.-W. ; Ma, S.-B. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.416-424, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

Yu, S.-Y. ; Kim, S.-H. ; Cha, B.-C. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.83-89, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

4. The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]

Yoon, G.-S. ; Kim, S.-H. ; Park, J.-S. ; Choi, S.-Y. ; Jean, C.-U. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.703-713, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

5. Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]

Ahn, W.-S. ; Kwon, H.-J. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.818-826, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

6. Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Hwang, C. ; Nam, D.-S. ; Park, J.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.947-952, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

7. Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Kim, H. ; Nam, D. ; Yeo, G.-S. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.459-462, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

8. Study of Over-polishing at the Edge of a Pattern in Selective CMP

Park, J.-H. ; Park, D.-W. ; Lee, J.-D. ; Hong, C. ; Han, W.-S. ; Moon., J.-T.

Pub. info.:	Chemical Mechanical Planarization : proceedings of the International Symposium. pp.283-289, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-21

Conference Proceedings

9. Study of Cr patch validity for ArF CPL mask and its fabrication

Kim, C.-H. ; Kim, S.-H. ; Lee, M.-S. ; Park, J.-S. ; Shin, I.-G. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.1247-1254, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

10.

Conference Proceedings

10. Impact of illumination intensity profile on lithography simulation

Hwang, C. ; Kim, I. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.1427-1434, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Author: Han, W.-S.