1.

Conference Proceedings
Conference Proceedings
1. Quantitative analysis of develop loading effect and its application
Han, H. -S. ; Moon, S. -G. ; Yoon, J. -B. ; Kim, B. -G. ; Moon, S. -Y. ; Choi, S. -W. ; Han, W. -S.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.213-219,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. Optimized distributed computing environment for mask data preparation [5992-41]
Ahn, B. -S. ; Bang, J. -M. ; Ji, M. -K. ; Kang, S. ; Jang, S. -H. ; Choi, Y. -H. ; Ki, W. -T. ; Choi, S. -W. ; Han, W. -S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599214-599214,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. How large MEEF is acceptable for the low-k1 lithography- [5992-97]
Nam, D. ; Lee, D. -G. ; Kim, B. ; Moon, S. -Y. ; Choi, S. -W. ; Han, W. -S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922W-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. Analysis of various blur effects on mask CD distortion [5992-166]
Han, H. -S. ; Lee, S. -H. ; Kim, B. -G. ; Moon, S> -Y. ; Choi, S. -W. ; Han, W. -S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924V-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Analysis of in-field uniformity on wafer considering exposure margin and MEEF
Cha, B. -C. ; Kim, S. -Y. ; Kim, S. -H. ; Yu, S. -Y. ; Jeon, C. -U. ; Yoon, H. -S. ; Han, W. -S.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1368-1376,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567