1.

Conference Proceedings
Conference Proceedings
1. Optical Fourier transform scatterometry for LER and LWR metrology
Seo, S, -C. ; Cavelaars, J. ; Maltabes, J. ; Han, S.-I. ; Kearney, P. ; Krick, D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.192-203,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
2.

Conference Proceedings
Conference Proceedings
2. Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
Han, S.-I. ; Weisbrod, E. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.314-330,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Recovery of Mo/Si-multilayer-coated LTEM substrate
Mangat, P.S.J. ; Talin, A.A. ; Hooper, A.F. ; Convey, D. ; Han, S.-I. ; Wasson, J.R.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.426-430,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Integration of antireflection coatings on EUV absorber stacks
Wasson, J.R. ; Han, S.-I. ; Edwards, N.V. ; Weisbrod, E. ; Dauksher, W.J. ; Mangat, P.J.S. ; Pettibone, D.W.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.382-388,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
Han, S.-I. ; Wasson, J.R. ; Mangat, P.J.S. ; Cobb, J.L. ; Lucas, K. ; Hector, S.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.481-494,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
6.

Conference Proceedings
Conference Proceedings
6. Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials
Han, S.-I. ; Weisbrod, E. ; Wasson, J.R. ; Gregory, R. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J. ; Rosfjord, K.M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.261-270,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
7.

Conference Proceedings
Conference Proceedings
7. EUV radiation damage test on EUVL mask absorber materials
Lu, B. ; Wasson, J.R. ; Han, S.-I. ; Mangat, P. ; Golovkina, V. ; Cerrina, F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1232-1238,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256