1.

Conference Proceedings
Conference Proceedings
1. Advanced FIB mask repair technology in ArF lithography
Hiruta,K. ; Kubo,S. ; Morimoto,H. ; Yasaka,A. ; Hagiwara,R. ; Adachi,T. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.523-530,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
2.

Conference Proceedings
Conference Proceedings
2. Advanced FIB mask repair technology for ArF lithography: ？
Kubo,S. ; Hiruta,K. ; Morimoto,H. ; Yasaka,A. ; Hagiwara,R. ; Adachi,T. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.158-164,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Advanced FIB mask repair technology for ArF lithography: ？
Hagiwara,R. ; Yasaka,A. ; Takaoka,O. ; Kozakai,T. ; Yabe,S. ; Koyama,Y. ; Muramatsu,M. ; Doi,T. ; Suzuki,K. ; Okabe,M. ; Aita,K. ; Adachi,T. ; Kubo,S. ; Yoshioka,N. ; Morimoto,H. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.555-562,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409