Search records | 東京工業大学附属図書館文献データベース

Sort order

4 results

Conference Proceedings

1. Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

C.-N. Ahn ; K.-H. Baik ; Y.-S. Lee ; H.-E. Kim ; I.-B. Hur

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.222-239, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

2. Implementation of i-line lithography to 0.30 µm design rules

K.-Y. Kim ; H.-E. Kim ; I.-H. Lee ; J.-S. Kim ; J.-S. Chun

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.76-89, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

3. Effect of pattern density for contact windows in an attenuated phase shift mask

I.-B. Hur ; J.-H. Kim ; I.-H. Lee ; H.-E. Kim ; C.-N. Ahn

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.278-289, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

4. Challenges for the quality control of assist features for 45nm node technology and beyond

L. Wang ; T. Lukanc ; M. Takahashi ; H.-E. Kim ; K. Phan

Pub. info.:	Photomask technology 2008. 1 pp.71220Z-1-71220Z-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122