1.

Conference Proceedings
Conference Proceedings
1. Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
F. A. Houle ; A. fornof ; D. C. Miller ; S. Raoux ; H. Truong
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210B-1-69210B-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
2.

Conference Proceedings
Conference Proceedings
2. Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography
F. A. Houle ; A. Fornof ; R. Sooriyakumaran ; H. Truong ; D. C. Miller ; M. I. Sanchez ; B. Davis ; T. Magbitang ; R. D. Allen ; M. W. Hart ; G. Dubois
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. The limitations of high-index resists for 193-nm hyper-NA lithography
G. Mcintyre ; D. Sanders ; R. Sooriyakumaran ; H. Truong ; R. Allen
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692304-1-692304-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
4.

Conference Proceedings
Conference Proceedings
4. A new class of low bake resists for 193-nm immersion lithography
R. Sooriyakumaran ; R. DiPietro ; H. Truong ; P. Brock ; R. Allen
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230C-1-69230C-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923