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15 results

Conference Proceedings

1. Chromium-based attenuated phase shifter for DUV exposure

H. Mohri ; M. Takahashi ; K. Mikami ; H. Miyashita ; N. Hayashi

Pub. info.:	14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California. pp.288-298, 1994. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2322

Conference Proceedings

2. Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure

K. Mikami ; H. Mohri ; H. Miyashita ; N. Hayashi ; H. Sano

Pub. info.:	Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan. pp.333-342, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2512

Conference Proceedings

3. EUV mask pattern inspection using current DUV reticle inspection tool

T. Abe ; A. Fujii ; S. Sasaki ; H. Mohri ; H. Imai ; H. Takaya ; Y. Sato ; N. Hayashi ; Y. Maenaka

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

4. Analysis of diffraction orders including mask topography effects for OPC optimization

Y. Inazuki ; N. Toyama ; T. Adachi ; T. Nagai ; T. Suto ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

5. Pupil plane analysis on AIMS 45-193i for advanced photomasks

Y. Morikawa ; T. Sutou ; K. Mesuda ; T. Nagai ; Y. Inazuki ; T. Adachi ; N. Toyama ; H. Mohri ; N. Hayashi ; U. Stroessner ; R. Birkner ; R. Richter ; T. Scheruebl

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

6. Estimation of shot counts in VSB writer using GDSII design data

S. Narukawa ; H. Mohri ; N. Hayashi ; Y. Nagamura ; K. Hosono

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

7. Methodology of adhesive energy for photomask fabrication using scanning probe microscopy

S. Shimada ; T. Shimomura ; K. Yoshida ; M. Kurihara ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

8. Extendibility of single mask exposure for practical ArF immersion lithography

T. Adachi ; Y. Inazuki ; T. Sutou ; T. Nagai ; N. Toyama ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

9. Progress of NIL template making

S. Yusa ; T. Hiraka ; A. Kobiki ; S. Sasaki ; K. Itoh ; N. Toyama ; M. Kurihara ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

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Conference Proceedings

10. Approach to analyze decomposition impact for photomask fabrication

N. Toyama ; T. Adachi ; Y. Inazuki ; T. Sutou ; T. Nagai ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

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Author: H. Mohri