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Conference Proceedings

1. Adapting immersion exposure to mass production by adopting a cluster of novel resist-coating/developing and immersion-exposure equipment

T. Fujiwara ; J. Ishikawa ; T. Kawakubo ; Y. Ishii ; H. Kyoda ; S. Wakamizu ; T. Shimoaoki

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

2. Behavior and effects of water penetration in 193-nm immersion lithography process materials

T. Niwa ; S. Scheer ; M. Carcasi ; M. Enomoto ; T. Tomita ; K. Hontake ; H. Kyoda ; J. Kitano

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

3. Process optimization for developer soluble immersion topcoat material

H. Nakagawa ; K. Goto ; M. Shima ; J. Takahashi ; T. Shimokawa ; K. Ichino ; N. Nagatani ; H. Kyoda ; K. Yoshihara

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

4. Defectivity reduction studies for ArF immersion lithography

K. Matsunaga ; T. Kondoh ; H. Kato ; Y. Kobayashi ; K. Hayasaki ; S. Ito ; A. Yoshida ; S. Shimura ; T. Kawasaki ; H. Kyoda

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519