1.

Conference Proceedings
Conference Proceedings
1. Double exposure using 193nm negative tone photoresist
R. Kim ; T. Wallow ; J. Kye ; H. J. Levinson ; D. White
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography
C. S. Saravanan ; S. Nirmalgandhi ; O. Kritsun ; A. Acheta ; R. Sandberg ; B. L. Fontaine ; H. J. Levinson ; K. Lensing ; M. Dusa ; J. Hauschild ; A. Pici
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry
O. Kritsun ; B. L. Fontaine ; R. Sandberg ; A. Acheta ; H. J. Levinson ; K. Lensing ; M. Dusa ; J. Hauschild ; A. Pici ; C. Saravanan ; K. Primak ; R. Korlahalli ; S. Nirmalgandhi
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
4.

Conference Proceedings
Conference Proceedings
4. Polarization aberration analysis using Pauli-Zernike representation
N. Yamamoto ; J. Kye ; H. J. Levinson
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
5.

Conference Proceedings
Conference Proceedings
5. Characterization of photo-acid redeposition in 193-nm photoresists
T. Wallow ; M. Plat ; Z. Zhang ; B. MacDonald ; J. Bernard ; J. Romero ; B. L. Fontaine ; H. J. Levinson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
6.

Conference Proceedings
Conference Proceedings
6. Proposal for determining exposure latitude requirements
H. J. Levinson ; Y. Ma ; M. Koenig ; B. La Fontaine ; R. Seltmann
Pub. info.: Optical Microlithography XXI.  1  pp.69241J-1-69241J-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
7.

Conference Proceedings
Conference Proceedings
7. Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer
T. Wallow ; A. Acheta ; Y. Ma ; A. Pawloski ; S. Bell ; B. Ward ; C. Tabery ; B. L. Fontaine ; R. Kim ; S. McGowan ; H. J. Levinson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
8.

Conference Proceedings
Conference Proceedings
8. The use of EUV lithography to produce demonstration devices
A. La Fontaine ; Y. Deng ; R. Kim ; H. J. Levinson ; S. McGowan
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210P-1-69210P-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
9.

Conference Proceedings
Conference Proceedings
9. Line edge roughness impact on critical dimension variation
Y. Ma ; H. J. Levinson ; T. Wallow
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518