1.

Conference Proceedings
Conference Proceedings
1. Distribution control of protecting groups and its effect on LER for EUV molecular resist
D. Shiono ; H. Hada ; H. Yukawa ; H. Oizumi ; I. Nishiyama ; K. Kojima ; H. Fukuda
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Material design of negative-tone polyphenol resist for EUV and EB lithography
K. Kojima ; S. Mori ; D. Shiono ; H. Hada ; J. Onodera
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519