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16 results

Conference Proceedings

1. Estimation of breast density on digital mammograms

S. Goto ; Y. Azuma ; H. Aoyama ; T. Sumimoto

Pub. info.:	Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo -Electronic Technology, and Artificial Intelligence : 13-15 October 2006, Beijing, China. pp.63571R-1-63571R-5, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6357

Conference Proceedings

2. High-accuracy measuring method of absorbed dose using radiochromic film and a microdensitometer for high-energy x rays

H. Aoyama ; Y. Azuma ; S. Goto ; T. Sumimoto

Pub. info.:	Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo -Electronic Technology, and Artificial Intelligence : 13-15 October 2006, Beijing, China. pp.63571L-1-63571L-5, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6357

Conference Proceedings

3. Double phase-conjugate mirrors in KNSBN:Cu crystal

X. Gao ; A. Sasaki ; Y. Zheng ; H. Aoyama ; J. Fukaya

Pub. info.:	Second International Conference on Optoelectronic Science and Engineering '94 : 15-18 August 1994, Beijing, China. pp.568-570, 1994. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2321

Conference Proceedings

4. EUVL practical mask structure with light shield area for 32nm half pitch and beyond

T. Kamo ; H. Aoyama ; T. Tanaka ; O. Suga ; T. Abe

Pub. info.:	Photomask technology 2008. 2 pp.712227-1-712227-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122

Conference Proceedings

5. Effects of mask absorber thickness on printability in EUV lithography with high resolution resist

T. Kamo ; H. Aoyama ; T. Tanaka ; O. Suga

Pub. info.:	Photomask and next-generation lithography mask technology XV. 2 pp.70281R-1-70281R-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

Conference Proceedings

6. Nanometer-scale manipulator and ultrasonic cutter using an atomic force microscope controlled by a haptic device

F. Iwata ; S. Kawanishi ; A. Sasaki ; H. Aoyama ; T. Ushiki

Pub. info.:	Fifth International Symposium on Instrumentation Science and Technology. 2 pp.71334E-1-71334E-7, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7133

Conference Proceedings

7. Study of impacts of mask structure on hole pattern in EUVL

N. Iriki ; Y. Arisawa ; H. Aoyama ; T. Tanaka

Pub. info.:	Photomask technology 2007. 3 pp.67305K-1-67305K-10, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

Conference Proceedings

8. Repair specification study for half-pitch 32-nm patterns for EUVL

H. Aoyama ; T. Amano ; Y. Nishiyamo ; H. Shigemura ; O. Suga

Pub. info.:	Photomask technology 2007. 3 pp.67305L-1-67305L-10, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

Conference Proceedings

9. Flare evaluation for 32-nm half pitch using SFET

H. Aoyama ; Y. Tanaka ; T. Komo ; N. Iriki ; Y. Arisawa

Pub. info.:	Emerging lithographic technologies XII. 2 pp.69213H-1-69213H-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6921

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Conference Proceedings

10. Evaluation results for Selete's exposure tool: impact of the source performance

K. Tawarayama ; S. Magoshi ; H. Aoyama ; Y. Tanaka ; S. Shirai

Pub. info.:	Emerging lithographic technologies XII. 2 pp.69212V-1-69212V-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6921

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Author: H. Aoyama