1.

Conference Proceedings
Conference Proceedings
1. Requirements of nano-machining repair system for 45-nm node
S. -H. Lee ; H. -S. Kim ; H. -S. Shim ; S. -Y. Lee ; G. -B. Kim ; H. -J. Kwon ; S. -G. Woo ; H. -K. Cho
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. Shot based MRC flow by using full chip MRC tool
M. -K. Ji ; S. -H. Jang ; S. -J. Son ; J. -H. Choi ; S. -G. Woo ; H. -K. Cho
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
3.

Conference Proceedings
Conference Proceedings
3. Optical performance enhancement technique for 45-nm node with binary mask
J. -S. Jung ; H. -B. Kim ; J. -W. Lee ; S. G. Woo ; H. -K. Cho
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
4.

Conference Proceedings
Conference Proceedings
4. Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask
Y. -M. Kang ; S. -J. Kim ; J. -B. Park ; W. Chang ; S. -W. Park ; J. -S. Kim ; H. -K. Cho ; H. -K. Oh
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
5.

Conference Proceedings
Conference Proceedings
5. Robust approach to determine the optimized illumination condition using process window analysis
Y. -J. Chun ; S. -W. Lee ; S. Lee ; Y. -M. Lee ; S. Suh ; S. -J. Lee ; H. -K. Cho ; H. -J. Park ; B. Falch
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
6.

Conference Proceedings
Conference Proceedings
6. Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine
W. -T. Ki ; J. -H. Choi ; B. -G. Kim ; S. -G. Woo ; H. -K. Cho
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280E-1-70280E-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028