1.

Conference Proceedings
Conference Proceedings
1. Effect of PEB temperature profile on CD for DUV resists
Lewellen,J.W. ; Gurer,E. ; Lee,E. ; Chase,L.C. ; Dulmage,L.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.45-54,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
2.

Conference Proceedings
Conference Proceedings
2. Configurational metastability carbon-phosphorus pair defects in sillicon
Gurer,E. ; Benson,B.W. ; Watkins,G.D.
Pub. info.: Proceedings of the 16th International Conference on Defects in Semiconductors : Lehigh University, Bethlehem, Pennsylvania, 22-26 July 1991.  Pt.1  pp.339-344,  1992.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 83-87
3.

Conference Proceedings
Conference Proceedings
3. Novel spin-coating technology for 248-nm/193-nm DUV lithography and low-k spin on dielectrics of 200-mm/300-mm wafers
Gurer,E. ; Zhong,T.X. ; Lewellen,J.W. ; Lee,E.C.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.805-817,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Novel wafer track-based resolution enhancement technology for 248-nm DUV lithography
Zhong,T.X. ; Gurer,E. ; Lewellen,J.W. ; Lee,E.C.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.793-804,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Characterization of sub-0.18-ｦﾌm critical dimension pattern collapse for yield improvement
Zhong,T.X. ; Gurer,E. ; Lee,E. ; Bai,H. ; Gendron,B. ; Krishna,M.S. ; Reynolds,R.M.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.158-168,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
6.

Conference Proceedings
Conference Proceedings
6. The Multiconfigurational Carbon-Antimony Pair in Silicon
Benson,B.W. ; Gurer,E. ; Watkins,G.D.
Pub. info.: Proceedings of the 15th International Conference on Defects in Semiconductors : Budapest, Hungary, August 22-26, 1988.  Part1  pp.391-396,  1989.  Aederlmannsdorf, Switzwelns.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 38-41
7.

Conference Proceedings
Conference Proceedings
7. Integrated yield and CD enhancement for advanced DUV Lithography
Krishna,M.S. ; Gurer,E. ; Zhong,T.X. ; Lee,E. ; Salois,J.W. ; Reynolds,R.M.
Pub. info.: In-Line Methods and Monitors for Process and Yield Improvement.  pp.56-64,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3884