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34 results

Conference Proceedings

1. Modeling of non-uniform device geometries for post-lithography circuit analysis [6156-54]

Gupta, P. ; Kahng, A. ; Kim, Y. ; Shah, S. ; Sylvester, D.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560U-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

2. Lithography simulation-based full-chip design analyses [6156-56]

Gupta, P. ; Kahng, A. B. ; Nakagawa, S. ; Shah, S. ; Sharma, P.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560T-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

3. Modeling edge placement error distribution in standard cell library [6156-57]

Gupta, P. ; Kahng, A. B. ; Muddu, S. V. ; Nakagawa, S.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

4. Self-compensating design for reduction of timing and leakage sensitivity to systematic pattern dependent variation [6156-10]

Gupta, P. ; Kahng, A. B. ; Kim, Y. ; Sylvester, D.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

5. EFFECTS OF HYDROGEN COVERAGE ON SILICON SURFACE REACTIVITY

Dillon, AC. ; Robinson, M.B. ; George, S.M. ; Gupta, P.

Pub. info.:	Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.99-104, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	259

Conference Proceedings

6. ADSORPTION AND DESORPTION KINETICS FOR CHLOROSILANES ON Si(111)7x7

Gupta, P. ; Coon, P.A. ; Koehler, B.G. ; Wise, M.L. ; George, S.M.

Pub. info.:	Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A.. pp.311-318, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	204

Conference Proceedings

7. COMPARISON OF H2 DESORPTION KINETICS FROM Si(111)7x7 AND Si(100)2xl

Wise, M.L. ; Koehler, B.G. ; Gupta, P. ; Coon, P.A. ; George, S.M.

Pub. info.:	Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A.. pp.319-326, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	204

Conference Proceedings

8. FTIR STUDIES OF WATER AND AMMONIA DECOMPOSITION ON SILICON SURFACES

Dillon, A.C. ; Gupta, P. ; Robinson, M.B. ; Bracker, A.S. ; George, S.M.

Pub. info.:	Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A.. pp.339-344, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	204

Conference Proceedings

9. REMOVAL OF Cu FROM Si WAFER SURFACES USING DILUTE HF-HC1 SOLUTIONS

Dhanda, S. ; Chiarello, R.P. ; Helms, C.R. ; Gupta, P.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.136-142, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

10.

Conference Proceedings

10. Fe REMOVAL IN SC2 SOLUTIONS

Dhanda, S. ; Chiarello, R.P. ; Helms, C.R. ; Gupta, P.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.113-119, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

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