1.

Conference Proceedings
Conference Proceedings
1. Tungsten Silicide/Polysilicon Stack Etching Using Mixed Fluorine-Chlorine Chemistry in a High Density Plasma Camber
Zaleski, M. ; Simpson, L. ; Guerry, A.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.203-209,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4
2.

Conference Proceedings
Conference Proceedings
2. Implementation of Reference Measurement System using CD-AFM
Dixson, R.G. ; Guerry, A. ; Bennett, M.H. ; Vorburger, T.V. ; Bunday, B.D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.150-165,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Reference metrology using a next-generation CD-AFM
Dixson, R. ; Guerry, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.633-646,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Toward traceability for at-line AFM dimensional metrology
Dixson, R.G. ; Guerry, A. ; Bennett, M.H. ; Vorburger, T.V. ; Postek, M.T., Jr.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.313-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689