1.

Conference Proceedings
Conference Proceedings
1. MICROC-REFLECTION SPECTROSCOPY PROFILING OF INTER-DIFFUSION IN EPITAXIAL HgCdTe
Grimbergen, M. ; Szilagyi, A.
Pub. info.: Materials characterization : symposium held April 15-17, 1986, Palo Alto California, U.S.A..  pp.257-264,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 69
2.

Conference Proceedings
Conference Proceedings
2. COMPARISON OF ELECTRON BEAM-INDUCED AND LIGHT- INDUCED DEFECT SATURATION IN a-Si:H
Grimbergen, M. ; Lopez-Otero, A. ; Fahrenbruch, A. ; Benatar, L. ; Redfield, D. ; Bube, R. ; McConville, R.
Pub. info.: Amorphous silicon technology, 1992.  pp.443-448,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 258
3.

Conference Proceedings
Conference Proceedings
3. ISOLATION OF TEMPERATURE EFFECTS ON THE KINETICS OF LIGHT INDUCED DEFECT GENERATION IN a-Si:H
Benatar, L. ; Grimbergen, M. ; Fahrenbruch, A. ; Lopez-Otero, A. ; Redfield, D. ; Bube, R.
Pub. info.: Amorphous silicon technology, 1992.  pp.461-466,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 258
4.

Conference Proceedings
Conference Proceedings
4. COUPLED EFFECTS OF LIGHT AND TEMPERATURE ON DEGRADATION OF a-Si:H
Benatar, L.E. ; Grimbergen, M. ; Redfield, D. ; Bube, R.H.
Pub. info.: Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.117-122,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 219
5.

Conference Proceedings
Conference Proceedings
5. RELAXATION OF ELECTRON BEAM-INDUCED METASTABLE DEFECTS IN a-Si:H
Grimbergen, M. ; McConville, R. ; Redfield, D. ; Bube, R.H.
Pub. info.: Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A..  pp.655-660,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 297
6.

Conference Proceedings
Conference Proceedings
6. Quartz etch challenges for 45 nm phase-shift masks [6283-28]
Anderson, A. S. ; Chandrachood, M. ; Grimbergen, M. ; Leung, B. Y. T. ; Ibrahim, I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
7.

Conference Proceedings
Conference Proceedings
7. Quartz etch solutions for 45-nm phase-shift masks [6349-119]
Chandrachood, M. ; Grimbergen, M. ; Leung, T. Y. B. ; Panayil, S. ; Ibrahim, I. ; Kumar, A.
Pub. info.: Photomask Technology 2006.  pp.634934-634934,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
8.

Conference Proceedings
Conference Proceedings
8. Chrome etch challenges for 45 nm and beyond [6283-27]
Chandrachood, M. ; Grimbergen, M. ; Ibrahim, M. I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
9.

Conference Proceedings
Conference Proceedings
9. Chrome etch solutions for 45-nm and beyond [6349-118]
Chandrachood, M. ; Grimbergen, M. ; Ibrahim, I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask Technology 2006.  pp.634933-634933,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
10.

Conference Proceedings
Conference Proceedings
10. Photomask etch challenges for futute technology nodes [6283-132]
Chandrachood, M. ; Grimbergen, M. ; Leung, B. Y. T. ; Koch, R. Yu. K. ; Chen, J. ; Ibrahim, M. I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283