1.

Conference Proceedings
Conference Proceedings
1. Does technology acceleration equate to mask cost acceleration? (Invited Paper)
Trybula, W.J. ; Grenon, B.J.
Pub. info.: Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA.  pp.93-99,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5043
2.

Conference Proceedings
Conference Proceedings
2. Porous silica frame for deep UV lithography
Meixner, D.L. ; Ganguli, R. ; Robinson, T. ; Jeng, D.-Y. ; Morris, M.W. ; Chaudhuri, S.R. ; Grenon, B.J.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1018-1024,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Investigation of reticle defect formation at DUV lithography
Bhattacharyya, K. ; Volk, W.W. ; Grenon, B.J. ; Brown, D. ; Ayala, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.478-487,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Porous silica frame for deep-UV lithography
Meixner, D.L. ; Ganguli, R. ; Robinson, T. ; Jeng, D.-Y. ; Morris, M. ; Chaudhuri, S.R. ; Grenon, B.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.450-456,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Reticle surface contaminants and their relationship to sub-pellicle defect formation
Grenon, B.J. ; Bhattacharyya, K. ; Volk, W.W. ; Phan, K.A. ; Poock, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.355-362,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Porous silica pellicle frame
Jeng, D.-Y. ; Meixner, D.. L. ; Ganguli, R. ; Colbern, S.G. ; Robinson, T. ; Morris, M.W. ; Chaudhuri, S.R. ; Grenon, B.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.213-221,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Reticle surface contaminants and their relationship to subpellicle particle formation
Grenon, B.J. ; Bhattacharyya, K. ; Volk, W.W. ; Poock, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1103-1110,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256