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Conference Proceedings

1. Electron-beam mask repair with induced reactions

Koops, H.W.P. ; Edinger, K. ; Bihr, J. ; Boegli, V.A. ; Greiser, J.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.90-97, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

2. Application of electron-beam-induced processes to mask repair

Edinger, K. ; Boegli, V.A. ; Budach, M. ; Hoinkis, O. ; Weyrauch, B. ; Koops, H.W.P. ; Bihr, J. ; Greiser, J.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.383-390, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

3. Electron-beam-induced processes and their applicability to mask repair

Boegli, V.A. ; Koops, H.W.P. ; Budach, M. ; Edinger, K. ; Hoinkis, O. ; Weyrauch, B. ; Becker, R. ; Schmidt, R. ; Kaya, A. ; Reinhardt, A. ; Brauuer, C. ; Honold, H. ; Bihr, J. ; Greiser, J. ; Eisenmann, M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.283-292, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

4. New crossbeam inspection tool combining an ultrahigh-resolution field emission SEM and a high-resolution FIB

Gnauck, P. ; Hoffrogge, P. ; Greiser, J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.833-840, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

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