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Conference Proceedings

1. Lithography simulation employing rigorous solutions to Maxwell's equations

Gordon,R.L. ; Mack,C.A.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.176-196, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Alternating PSM phase defect printability for 100-nm KrF lithography

Kim,J. ; Mo,W.-P. ; Gordon,R.L. ; Williams,A.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.308-320, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

3. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.73-89, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

4. Deducing aerial image behavior from AIMS data

Gordon,R.L. ; Flagello,D.G. ; McCallum,M.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.734-743, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Mask topography effects in low k1 lithography

McCallum,M. ; Gordon,R.L.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.695-700, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Friedrich,C. ; Mader,L. ; Erdmann,A. ; List,S. ; Gordon,R.L. ; Kalus,C.K. ; Griesinger,U.A. ; Pforr,R. ; Mathuni,J. ; Ruhl,G.G. ; Maurer,W.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1323-1335, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Mask topography simulation for EUV lithography

Gordon,R.L. ; Mack,C.A.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.283-297, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

8. CD control for two-dimensional features in future technology nodes

Verhaegen,S. ; Gordon,R.L. ; Jonckheere,R.M. ; McCallum,M. ; Ronse,K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.368-378, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Design and analysis of manufacturable alternating phase-shifting masks

Gordon,R.L. ; Mack,C.A. ; Petersen,J.S.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.606-616, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

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Conference Proceedings

10. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.288-303, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

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Author: Gordon,R.L.