1.

Conference Proceedings
Conference Proceedings
1. Design of an etch-resistant cyclic olefin photoresist
Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; DiPietro,R.A. ; Hofer,D.C. ; Jayaraman,S. ; Hullihan,K.A. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.463-471,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. NEW OLEFINIC INTERLEVEL DIELECTRIC MATERIALS FOR MULTI-CHIP MODULES
Kohl,Paul ; Bidstrup-Allen,S.A. ; Grove,N.R. ; Schick,R.A. ; Goodall,B.L. ; McIntosh,L.H. ; Jayaraman,S.
Pub. info.: 1996 International Conference on Multichip Modules : proceedings, April 17-19, 1996, Denver, Colorado.  pp.380-384,  1996.  Reston, Va..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2794