1.

Conference Proceedings
Conference Proceedings
1. Fabrication of suspended membranes for thermal sensors using high-density plasma etching
Tserepi, A. ; Tsamis, C. ; Gogolides, E. ; Nassiopoulou, A.G.
Pub. info.: Design, test, integration, and packaging of MEMS/MOEMS 2002 : 6-8 May, 2002, Cannes, France.  pp.776-783,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4755
2.

Conference Proceedings
Conference Proceedings
2. Highly Anisotropic Silicon Reactive Ion Etching for Nanofabrication with Fluorine Only Containing Gases
Grigoropoulos, S. ; Gogolides, E. ; Nassiopoulos, A.G.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.275-282,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
3.

Conference Proceedings
Conference Proceedings
3. Photoresist line-edge roughness analysis using scaling concepts
Constantoudis, V. ; Patsis, G.P. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.901-909,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
4.

Conference Proceedings
Conference Proceedings
4. Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists
Ercken, M. ; Leunissen, L.H.A. ; Pollentier, I. ; Patsis, G.P. ; Constantoudis, V. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.266-275,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Toward a complete description of linewidth roughness: a comparison of different methods for vertical and spatial LER and LWR analysis and CD variation
Constantoudis, V. ; Patsis, G.P. ; Leunissen, L.H.A. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.967-977,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis
Patsis, G.P. ; Constantoudis, V. ; Gogolides, E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.773-781,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
7.

Conference Proceedings
Conference Proceedings
7. Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography
Tegou, E. ; Bellas, V. ; Gogolides, E. ; Argitis, P. ; Dean, K.R. ; Eon, D. ; Cartry, G. ; Cardinaud, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.453-461,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039