1.

Conference Proceedings
Conference Proceedings
1. Robust methodology for state-of-the-art embedded SRAM bitcell design
Craig, M.J. ; Petersen, J.S. ; Lund, J. ; Gerold, D.J. ; Chen, N.-P.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.369-378,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. Developing an integrated imaging system for the 70-nm node using high numerical aperture ArF lithography
Petersen, J.S. ; Beach, J.V. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.274-287,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
3.

Conference Proceedings
Conference Proceedings
3. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of SCAA mask technology as a pathway to the 65-nm node
Beach, J.V. ; Petersen, J.S. ; Maslow, M.J. ; Gerold, D.J. ; McCafferty, D.C.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1103-1114,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Optical Microlithography XV.  Part One  pp.515-529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
Socha, R.J. ; Van Den Broeke, D.J. ; Yu, L. ; Conley, W. ; Wu, W. ; Chen, J.F. ; Petersen, J.S. ; Gerold, D.J. ; van Praagh, J. ; Droste, R. ; Flagello, D.G. ; Hsu, S.D.
Pub. info.: Optical Microlithography XV.  Part One  pp.446-458,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Imaging 100-nm contacts with high-transmission affenuated phase-shift masks
Beach, J.V. ; Petersen, J.S. ; Eynon, B.G. ; Taylor, D. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1242-1252,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
9.

Conference Proceedings
Conference Proceedings
9. Programmable lithography engine (ProLE) grid-type supercomputer and its applications
Petersen, J.S. ; Maslow, M.J. ; Gerold, D.J. ; Greenway, R.T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1477-1491,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040