1.

Conference Proceedings
Conference Proceedings
1. A new methodology for quantifying OPC recipe accuracy [5992-180]
Ziger, D. ; Gerold, D. ; King, C. ; Amoroso, F. ; Tuttle, J. ; Lugg, R.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599258-599258,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. 65nm mask CD qualification on critical features through simulation based lithography verification [5853-132]
van Adrichem, P. J. M. ; Valadez, J. ; Ziger, D. ; Gerold, D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.380-386,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853