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Conference Proceedings

1. Conducting electron-beam resists based on polyaniline

Hupcey,M.A.Z. ; Angelopoulos,M. ; Gelorme,J.D. ; Ober,C.K.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.369-374, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

2. Advanced negative resists using novel aminoplast crosslinkers

Afzali,A. ; Gelorme,J.D. ; Kosbar,L.L. ; Neisser,M.O. ; Brunswold,W. ; Feild,C. ; Lawson,M. ; Varanasi,R.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.758-767, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Patterning of highly conducting polyaniline films

Graham,T.O. ; Afzali,A. ; Angelopoulos,M. ; Gelorme,J.D. ; Shaw,J.M.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.334-343, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

4. Synthesis and lithographic performance of poly-4-hydroxphenyl-ethyl-methacrylate-based negative resists

Gelorme,J.D. ; Kosbar,L.L. ; Graham,T.O. ; Afzali,A.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.559-568, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999