1.

Conference Proceedings
Conference Proceedings
1. Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28]
Rody, Y. ; Martin, P. ; Couderc, C. ; Sixt, P. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Miramond-Collet, C. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Trouiller, Y.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920R-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Through-process window resist modelling strategies for the 65 nm node [5992-46]
Borjon, A. ; Belledent, J. ; Troullier, Y. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Gardin, C. ; Foussadier, F. ; Schiavone, P.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599219-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Sensitivity of a variable threshold model toward process and modeling parameters [6349-44]
Saied, M. ; Foussadier, F. ; Trouiller, Y. ; Belledent, J. ; Lucas, K. ; Schanen, I. ; Borjon, A. ; Couderc, C. ; Gardin, C. ; LeCam, L. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Yesilada, E.
Pub. info.: Photomask Technology 2006.  pp.634919-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Correction of long-range effects applied to the 65-nm node [5853-107]
Belledent, J. ; Word, J. ; Trouiller, Y. ; Couderc, C. ; Miramond, C. ; Toublan, O. ; Chapon, J.-D. ; Baron, S. ; Borjon, A. ; Foussadier, F. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Rody, Y. ; Sundermann, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.202-210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853