1.

Conference Proceedings
Conference Proceedings
1. Estimated impact of shot noise in extreme-ultraviolet lithography
Cobb, J.L. ; Houle, F.A. ; Gallatin, G.M.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.397-405,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node
Lai, K. ; Gallatin, G.M. ; Rosenbluth, A.E. ; Fonseca, C.A. ; Liebmann, L.W. ; Progler, C.J.
Pub. info.: Optical Microlithography XV.  Part One  pp.336-347,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. EUV photoresist performance results from the VNL and the EUV LLC
Cobb, J.L. ; Dentinger, P.M. ; Hunter, L.L. ; O'Connell, D.J. ; Gallatin, G.M. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Domke, W.-D. ; Wurm, S. ; Okoroanyanwu, U. ; Lee, S.H.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.412-420,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. Assessing the impact of intrinsic birefringence on 157-nm lithography
Seong, N. ; Lai, K. ; Rosenbluth, A.E. ; Gallatin, G.M.
Pub. info.: Optical Microlithography XVII.  pp.99-103,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. New paradigm in lens metrology for lithographic scanner: evaluation and exploration
Lai, K. ; Gallatin, G.M. ; van de Kerkhof, M.A. ; Boeij, Wim de ; Kok, H. ; Schriever, M. ; Morillo, J.D. ; Fair, R.H. ; Bennett, S. ; Corliss, D.A.
Pub. info.: Optical Microlithography XVII.  pp.160-171,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Fast calculation of images for high numerical aperture lithography
Rosenbluth, A.E. ; Gallatin, G.M. ; Gordon, R.L. ; Hinsberg, W. ; Hoffnagle, J. ; Houle, F. ; Lai, K. ; Lvov, A. ; Sanchez, M. ; Seong, N.
Pub. info.: Optical Microlithography XVII.  pp.615-628,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Effect of reduction ratio on polarization impact for imaging
Gordon, R.L. ; Brunner, T.A. ; Seong, N. ; Lercel, M.J. ; Gallatin, G.M.
Pub. info.: Optical Microlithography XVII.  pp.1499-1509,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Extendibility of chemically amplified resists: another brick wall? (Invited Paper)
Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Hoffnagle, J.A. ; Wallraff, G.M. ; Medeiros, D.R. ; Gallatin, G.M. ; Cobb, J.L.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.1-14,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
9.

Conference Proceedings
Conference Proceedings
9. Impact of thin resist processes on post-etch LER
Mahorowala, A.P. ; Goldfarb, D.L. ; Temple, K. ; Petrillo, K.E. ; Pfeiffer, D. ; Babich, K. ; Angelopoulos, M. ; Gallatin, G.M. ; Rasgon, S. ; Sawin, H.H. ; Allen, S.D. ; Lang, R.N. ; Lawson, M.C. ; Kwong, R.W. ; Chen, K.-J. ; Li, W. ; Varanasi, P.R. ; Sanchez, M.I. ; Ito, H. ; Wallraff, G.M. ; Allen, R.D.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.213-224,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039