1.

Conference Proceedings
Conference Proceedings
1. Effect of stage synchronization error of KrF scan on 0.18-ｦﾌm patterning
Uchiyama,T. ; Hashimoto,T. ; Fujimoto,M. ; Matsuura,S. ; Yamazaki,T. ; Kasama,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.67-76,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Depth-of-focus enhancement of isolated lines by multiple-focus exposure with negative-tone resist process
Fujimoto,M. ; Yamazaki,T. ; Hashimoto,T.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1100-1110,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Effects of ECR-Plasma Excitation in GaAs MBE Growth
Shibata,T. ; Yamamoto,N. ; Kondo,N. ; Nanishi,Y. ; Fujimoto,M.
Pub. info.: Plasma properties, deposition and etching.  pp.689-704,  1993.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 140-142
4.

Conference Proceedings
Conference Proceedings
4. Auger Electron Spectroscopy of Manganese Zinc Ferrites:Electron Beam Effect to the Grain Boundaries
Akita,C. ; Sekiguchi,S. ; Fujimoto,M. ; Haneda,H. ; Tanaka,J.
Pub. info.: Intergranular and interphase boundaries in materials : iib92 : proceedings of the 6th International Congress, Thessaloniki, Greece, June 21-26, 1992.  pp.105-108,  1993.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 126-128
5.

Conference Proceedings
Conference Proceedings
5. DOF enhancement of isolated line patterns by newly developed assistant pattern method
Matsuura,S. ; Hashimoto,T. ; Uchiyama,T. ; Fujimoto,M. ; Kasama,K.
Pub. info.: Optical Microlithography X.  pp.245-256,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
6.

Conference Proceedings
Conference Proceedings
6. Multiple-focus exposure in strong phase-shift lithography: improvement of CD-focus characteristics and CD controllability
Fujimoto,M. ; Yasuzato,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.703-712,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. Visualization of ultrafast dynamics of laser pulse propagation in the atmosphere using a novel measurement method:FTOP(femtosecond time-resolved optical polarigraphy)
Aoshima,S. ; Fujimoto,M. ; Hosoda,M. ; Tsuchiya,Y.
Pub. info.: High-Power Laser Ablation II.  pp.461-470,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3885
8.

Conference Proceedings
Conference Proceedings
8. Comparison between optical proximity effect of positive and negative tone patterns in KrF lithography
Fujimoto,M. ; Hashimoto,T. ; Uchiyama,T. ; Matsuura,S. ; Kasama,K.
Pub. info.: Optical Microlithography X.  pp.739-750,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051