1.

Conference Proceedings
Conference Proceedings
1. Recent progress in repair accuracy of the focused ion-beam mask repair system
Aita,K. ; Yasaka,A. ; Kitamura,T. ; Matsumura,H. ; Satoh,Y. ; Nakamura,H. ; Fujikawa,J. ; Tsuchiya,K. ; Noguchi,S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.324-335,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
2.

Conference Proceedings
Conference Proceedings
2. Performance of gas-assisted FIB repair for opaque defects
Satoh,Y. ; Nakamura,H. ; Fujikawa,J. ; Tsuchiya,K. ; Noguchi,S. ; Aita,K. ; Yasaka,A.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.124-137,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
3.

Conference Proceedings
Conference Proceedings
3. Development of bilayered TaSiOx-HTPSM: ？
Motonaga,T. ; Ohtsuki,M. ; Kinase,Y. ; Nakagawa,H. ; Yokoyama,T. ; Mohri,H. ; Fujikawa,J. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.155-163,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Development of bilayered TaSiOx-HTPSM: ？
Yokoyama,T. ; Yusa,S. ; Okamura,T. ; Nakagawa,H. ; Motonaga,T. ; Mohri,H. ; Fujikawa,J. ; Hayashi,N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.164-171,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409