1.

Conference Proceedings
Conference Proceedings
1. New materials for 157-nm photoresists characterization and properties
Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Periyasamy,M.P. ; III,F.L.Schadt ; Smalley,R.J. ; Zurnsteg,F.C. ; Kunz,R.R. ; Rao,V. ; Liao,L. ; Holl,S.M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.357-364,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Fluoropolyrners for 157-nm lithography:optical properties from VUV absorbance and ellipsometry measurements
French,R.H. ; Wheland,R.C. ; Jones,D.J. ; Hilfiker,J.N. ; Synowicki,R.A. ; Zumsteg,F.C. ; Feldman,J. ; Feiring,A.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1491-1502,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Optical superlattices as phase-shift masks for microlithography
Carcia,P.F. ; French,R.H. ; Reynolds,G.A.M. ; Hughes,G.P. ; Torardi,C.C. ; Reilly,M.H. ; Lemon,M.F. ; Miao,C.R. ; Jones,D.J. ; Wilson,L. ; Dieu,L.
Pub. info.: Engineered nanostructural films and materials : 22-23 July 1999, Denver, Colorado.  pp.23-35,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3790
4.

Conference Proceedings
Conference Proceedings
4. Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography
Carcia,P.F. ; French,R.H. ; Sharp,K.G. ; Meth,J.S. ; Smith,B.W.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.255-263,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
5.

Conference Proceedings
Conference Proceedings
5. Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
French,R.H. ; Gordon,J.S. ; Jones,D.J. ; Lemon,M.F. ; Wheland,R.C. ; Zhang,E. ; Zumsteg Jr.,F.C. ; Sharp,K.G. ; Qiu,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.89-97,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. 157-nm imaging using thick single-layer resists
Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Petrov,V.A. ; Schadt Ⅲ,F.L. ; Smalley,R.J. ; Zumsteg,F.C.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.428-438,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
7.

Conference Proceedings
Conference Proceedings
7. TiSi-nitride attenuating phase-shift photomask for 193-nm lithography
Reynolds,G.A.M. ; French,R.H. ; Carcia,P.F. ; Torardi,C.C. ; Hughes,G.P. ; Jones,D.J. ; Lemon,M.F. ; Reilly,M. ; Wilson,L. ; Miao,C.R.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.514-523,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546