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13 results

Conference Proceedings

1. Dendrimer-based chemically amplified resists for sub-100-nm lithography

Tully,D.C. ; Trimble,A.R. ; Frechet,J.M.J.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1202-1206, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

2. Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists

Niu,Q.J. ; Frechet,J.M.J. ; Okoroanyanwu,U. ; Byers,J.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.113-123, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

3. New single-layer positive photoresists for 193-nm photolithography

Okoroanyanwu,U. ; Shimokawa,T. ; Byers,J.D. ; Medeiros,D.R. ; Willson,C.G. ; Niu,Q.J. ; Frechet,J.M.J. ; Allen,R.D.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.92-103, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

4. Positive- and negative-tone water-processable photoresists: a progress report

Yamada,S. ; Medeiros,D.R. ; Patterson,K. ; Jen,W.-L.K. ; Rager,T. ; Lin,Q. ; Lenci,C. ; Byers,J.D. ; Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.245-253, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Structurally variable cyclopolymers with excellent etch resistance and their application to 193-nm lithography

Klopp,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Byers,J.D.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.23-30, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. New approach to 193-nm photoresists: polyspironorbornane polymers

Meagley,R.P. ; Park,L.Y. ; Frechet,J.M.J.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.83-90, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. Design and study of water-soluble positive- and negative-tone imaging materials

Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Medeiros,D.R. ; Patterson,K. ; Yamada,S. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.111-121, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

8. Design of a positive-tone water-soluble resist

Havard,J.M. ; Frechet,J.M.J. ; Pasini,D. ; Mar,B. ; Yamada,S. ; Medeiros,D.R. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.437-447, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

9. Novel Properties of(LiMO3Se3)n,a Polymeric Chevrel Cluster Compound:Thin Films of Macromolecular Wires Cast from Solution

Golden,J.H. ; DiSalvo,F.J. ; Frechet,J.M.J.

Pub. info.:	Soft chemistry routes to new materials : chimei douce : proceedings of the international symposium held at Nantes, France, September 6-10, 1993. pp.289-292, 1994. Zurich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	152-153

10.

Conference Proceedings

10. Tert-Butyllithium,a Selective and Convenient Reagent for the Reductive Intercalation of Interstitial Solids:A Novel Room Temperature Synthesis of(LiMO3Se3)n,a Soluble Polymeric Chevrel Cluster Compound

Golden,J.H. ; DiSalvo,F.J. ; Frechet,J.M.J.

Pub. info.:	Soft chemistry routes to new materials : chimei douce : proceedings of the international symposium held at Nantes, France, September 6-10, 1993. pp.209-212, 1994. Zurich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	152-153

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