1.

Conference Proceedings
Conference Proceedings
1. Two-color infrared focal plane array based on InAs/InGaAs/GaAs quantum dots in a well detectors design [5897-26]
Annamalai, S. ; Dowd, P. ; Forman, D. ; Varangis, P. ; Tumolillo, T. ; Gray, A. ; Sun, K. ; Liu, M. ; Campbell, J. ; Carothers, D. ; Krishna. S.
Pub. info.: Photonics for space environments X : 1-2 August 2005, San Diego, California, USA.  pp.58970P-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5897
2.

Conference Proceedings
Conference Proceedings
2. Back end of line metrology control applications using scatterometry [6152-90]
Towidjaja, L. ; Raymond, C. ; Littau, M. ; Forman, D. ; Hummel, S. G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Dome scatterometry for the measurement of advanced geometry semiconductor devices [6152-54]
Raymond, C. J. ; Littau, M. ; Forman, D. ; Hummel, S. G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
4.

Conference Proceedings
Conference Proceedings
4. Diffraction signature analysis methods for improving scatterometry precision [6152-125]
Littau, M. ; Forman, D. ; Bruce, J. ; Raymond, C. J. ; Hummel, S. G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615236-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
5.

Conference Proceedings
Conference Proceedings
5. Effect of grating pitch variation on scatterometry measurements [6152-177]
Forman, D. ; Littau, M. ; Raymond, C. J. ; Hummel, S. G
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61524D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152