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16 results

Conference Proceedings

1. A Comprehensive Study of the Electrical Stress Stability of n-Channel Poly-Si TFTs

Suntharalingam, V. ; Fonash, S.J. ; King, T.J.

Pub. info.:	Proceedings of the Third Symposium on Thin Film Transistor Technologies. pp.260-268, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-23

Conference Proceedings

2. ECR OXYGEN PLASMA CLEANING OF OXIDE ETCHED SURFACES

Mikulan, P.I. ; Fonash, S.J. ; Reinhardt, K.A. ; Ta, T.

Pub. info.:	Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.319-328, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-7

Conference Proceedings

3. COMPARISON OF IN SITU, ISOTROPIC DOWNSTREAM, AND INDUCTIVELY COUPLED PLASMA DOWNSTREAM POST-CONTACT ETCH CLEANING

Mikulan, P.I. ; Koo, T.T. ; Fonash, S.J. ; Reinhardt, K.A.

Pub. info.:	Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.307-312, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-7

Conference Proceedings

4. QUANTUM EFFICIENCY OF TEXTURED a-Si:H P-I-N SOLAR CELLS AFTER HIGH INTENSITY LIGHT-SOAKING

Li, X.R. ; Wagner, S. ; Bennett, M. ; Fonash, S.J.

Pub. info.:	Amorphous silicon technology, 1992. pp.929-934, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	258

Conference Proceedings

5. Damage Resulting from Polysilicon Gate Etching: Effect of Electrode Age and Sequencing within a Cassette

Mikulan, P.I. ; Awadelkarim, O.O. ; Fonash, S.J. ; Reinhardt, K.A. ; Rembetski, J.F.

Pub. info.:	Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control. pp.295-301, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-21

Conference Proceedings

6. Biomedical applications of nanostructured column-void si

Kalkan, A.K. ; Henry, M.R. ; Cuiffi, J.D. ; Li, H. ; Hayes, D.J. ; Fonash, S.J.

Pub. info.:	Nanoscale devices, materials, and biological systems : fundamentals and applications : proceedings of the international symposium. pp.585-600, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-13

Conference Proceedings

7. ELECTRON TRANSPORT MECHANISMS IN NICKEL SCHOTTKY BARRIER CONTACTS TO HYDROGENATED AMORPHOUS SILICON

Heller, D.E. ; Gunes, M. ; Rubinelli, F. ; Dawson, R.M. ; Nag, S. ; Fonash, S.J. ; Wronski, C.R.

Pub. info.:	Amorphous silicon technology, 1992. pp.1031-1036, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	258

Conference Proceedings

8. *SURFACE CONDITIONING ISSUES RELATED TO PATTERNING AND ETCHING

Fonash, S.J. ; Ditizio, R.A. ; Gu, T. ; Mikulan, P.I. ; Awadelkarim, O.O. ; Collins, R.W. ; Rembetski, J.F. ; Reinhardt, K.A. ; Chan, Y.D.

Pub. info.:	Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.55-68, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	259

Conference Proceedings

9. Low Temperature Polycrystalline Silicon Thin Films Deposited by ECR Plasma

Kalkan, A.K. ; Bae, S. ; Farber, D.G. ; Fonash, S.J.

Pub. info.:	Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. pp.214-222, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-30

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Conference Proceedings

10. Device Quality Room Temperature Deposited Silicon Nitride Films

Farber, D.G. ; Bae, S. ; Fonash, S.J.

Pub. info.:	Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. pp.253-264, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-30

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Author: Fonash, S.J.