1.

Conference Proceedings
Conference Proceedings
1. High-power EUV lithography sources based on gas discharges and laser-produced plasmas
Stamm, U. ; Ahmad, I. ; Balogh, I. ; Birner, H. ; Bolshukhin, D. ; Brudermann, J. ; Enke, S. ; Flohrer, F. ; Goebel, K. ; Goetze, S. ; Hergenhan, G. ; Kleinschmidt, J. ; Kloepfel, D. ; Korobotchko, V. ; Ringling, J. ; Schriever, G. ; Tran, C.D. ; Ziener, C.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.119-129,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
Stamm, U. ; Ahmad, I. ; Borisov, V.M. ; Flohrer, F. ; Gaebel, K. ; Goetze, S. ; Ivanov, A.S. ; Khristoforov, O,B. ; Kloepfel, D. ; Koehler, P. ; Kleinschmidt, J. ; Korobotchko, V. ; Ringling, J. ; Schriever, G. ; Vinokhodov, A.Y.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.122-133,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
3.

Conference Proceedings
Conference Proceedings
3. High-power sources for EUV lithography: state of the art
Stamm, U. ; Kleinschmidt, J. ; Gaebel, K.M. ; Birner, H. ; Ahmad, I. ; Bolshukhin, D. ; Brudermann, J. ; Chinh, T.D. ; Flohrer, F. ; Goetze, S. ; Hergenhan, G. ; Kloepfel, D. ; Korobochko, V. ; Mader, B. ; Mueller, R. ; Ringling, J. ; Schriever, G. ; Ziener, C.
Pub. info.: High-Power Laser Ablation V.  pp.722-736,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5448
4.

Conference Proceedings
Conference Proceedings
4. EUV source power and lifetime: the most critical issues for EUV lithography
Stamm, U. ; Kleinschmidt, J. ; Gaebel, K. ; Birner, H. ; Ahmad, I. ; Bolshukhin, D. ; Brudermann, J. ; Chinh, T.D. ; Flohrer, F. ; Goetze, S. ; Hergenhan, G. ; Kloepfel, D. ; Korobotchko, V. ; Mader, B. ; Mueller, R. ; Ringling, J. ; Schriever, G. ; Ziener, C.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.133-144,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
5.

Conference Proceedings
Conference Proceedings
5. High-power-gas-discharge- and laser-plasma-based EUV sources
Flohrer, F. ; Gaebel, K. ; Kloepfel, D. ; Koehler, P. ; Ahmad, I. ; Goetze, S. ; Kleinschmidt, J. ; Korobotchko,V. ; Ringling, J. ; Schriever, G. ; Stamm, U.
Pub. info.: Gas and Chemical Lasers and Intense Beam Applications III.  pp.264-270,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4631