1.

Conference Proceedings
Conference Proceedings
1. Probabilistic model for the mechanism of phenolic polymer dissolution
Flanagin,L.W. ; McAdams,C.L. ; Tsiartas,P.C. ; Henderson,C.L. ; Hinsberg,W.D. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.268-277,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Photoresist characterization for lithography simulation:IV.Processing effects on resist parameters
Henderson,C.L. ; Tsiartas,P.C. ; Flanagin,L.W. ; Pancholi,S. ; Chowdhury,S.A. ; Dombrowski,K.D. ; Chinwalla,A.N. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.212-223,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Recent advances in a molecular level lithography simulation
Schmid,G.M. ; Singh,V.K. ; Flanagin,L.W. ; Stewart,M.D. ; Burns,S.D. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.675-685,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Dissolution of phenolic polymers in aqueous base: the influence of polymer structure
McAdams,C.L. ; Flanagin,L.W. ; Henderson,C.L. ; Pawlowski,A.R. ; Tsiartas,P.C. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1171-1179,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Understanding nonlinear dissolution rates inphotoresists
Burns,S.D. ; Gardiner,A.B. ; Krukonis,V.J. ; Wetmore,P.M. ; Lutkenhaus,J. ; Schmid,G.M. ; Flanagin,L.W. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.37-49,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345