1.

Conference Proceedings
Conference Proceedings
1. New materials for 157-nm photoresists characterization and properties
Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Periyasamy,M.P. ; III,F.L.Schadt ; Smalley,R.J. ; Zurnsteg,F.C. ; Kunz,R.R. ; Rao,V. ; Liao,L. ; Holl,S.M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.357-364,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Fluoropolyrners for 157-nm lithography:optical properties from VUV absorbance and ellipsometry measurements
French,R.H. ; Wheland,R.C. ; Jones,D.J. ; Hilfiker,J.N. ; Synowicki,R.A. ; Zumsteg,F.C. ; Feldman,J. ; Feiring,A.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1491-1502,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. 157-nm imaging using thick single-layer resists
Crawford,M.K. ; Feiring,A.E. ; Feldman,J. ; French,R.H. ; Petrov,V.A. ; Schadt Ⅲ,F.L. ; Smalley,R.J. ; Zumsteg,F.C.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.428-438,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345