1.

Conference Proceedings
Conference Proceedings
1. Plasma etching of Cr photomasks:parametric comparisons of plasma sources and process conditions
Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Coleman,T.P. ; Faure,T.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.11-18,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. X-ray mask image-placement studies at the Microlithography Mask Development Center
Puisto,D. ; Lawliss,M. ; Faure,T. ; rocque,J.M. ; Kimmel,K.R. ; Benoit,D.E.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.204-210,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
3.

Conference Proceedings
Conference Proceedings
3. Plasma etching of Cr photomasks: optimization of process conditions and CD control
Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Coleman,T.P. ; Faure,T. ; Dubuque,L.F.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.94-103,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236