1.

Conference Proceedings
Conference Proceedings
1. Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window
M. Saied ; F. Foussadier ; J. Belledent ; Y. Trouiller ; I. Schanen ; C. Gardin ; J. C. Urbani ; P. K. Montgomery ; F. Sundermann ; F. Robert ; C. Couderc ; F. Vautrin ; G. Kerrien ; J. Planchot ; E. Yesilada ; C. Martinelli ; B. Wilkinson ; A. Borjon ; L. Le-Cam ; J. L. Di-Maria ; Y. Rody ; N. Morgana ; V. Farys
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner
Y. Trouiller ; V. Farys ; A. Borjon ; J. Belledent ; C. Couderc ; F. Sundermann ; J. Urbani ; Y. Rody ; C. Gardin ; J. Planchot ; W. Conley ; P. Goirand ; S. Warrick ; F. Robert ; G. Kerrien ; F. Vautrin ; B. Wilkinson ; M. Saied ; E. Yesilada ; P. Montgomery ; L. L. Cam ; C. Martinelli
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. Characterization of inverse SRAF for active layer trenches on 45-nm node
J. -C. Urbani ; J. -D. Chapon ; J. Belledent ; A. Borjon ; C. Couderc ; J. -L. Di-Maria ; V. Farys ; F. Foussadier ; C. Gardin ; G. Kerrien ; L. LeCam ; C. Martinelli ; P. Montgomery ; N. Morgana ; J. Planchot ; F. Robert ; Y. Rody ; M. Saied ; F. Sundermann ; Y. Trouiller ; F. Vautrin ; B. Wilkinson ; E. Yesilada
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
4.

Conference Proceedings
Conference Proceedings
4. Investigation of hyper-NA scanner emulation for photomask CDU performance
E. Poortinga ; T. Scheruebl ; W. Conley ; F. Sundermann
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
5.

Conference Proceedings
Conference Proceedings
5. OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes
F. Sundermann ; Y. Trouiller ; J. Urbani ; C. Couderc ; J. Belledent ; A. Borjon ; F. Foussadier ; C. Gardin ; L. LeCam ; Y. Rody ; M. Saied ; E. Yesilada ; C. Martinelli ; B. Wilkinson ; F. Vautrin ; N. Morgana ; F. Robert ; P. Montgomery ; G. Kerrien ; J. Planchot ; V. Farys ; J. D. Maria
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
6.

Conference Proceedings
Conference Proceedings
6. Study of SRAF placement for contact at 45 nm and 32 nm node
V. Farys ; F. Robert ; C. Martinelli ; Y. Trouiller ; F. Sundermann
Pub. info.: Optical Microlithography XXI.  2  pp.69242Z-1-69242Z-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
7.

Conference Proceedings
Conference Proceedings
7. Model-based mask verification on critical 45nm logic masks
F. Sundermann ; F. Foussadier ; T. Takigawa ; J. Wiley ; A. Vacca
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280U-1-70280U-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
8.

Conference Proceedings
Conference Proceedings
8. Model-based mask verification
F. Foussadier ; F. Sundermann ; A. Vacca ; J. Wiley ; G. Chen
Pub. info.: Photomask technology 2007.  3  pp.673051-1-673051-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
9.

Conference Proceedings
Conference Proceedings
9. Reticle haze: an industrial approach
S. Gough ; X. Gerard ; P. Bichebois ; A. Roche ; F. Sundermann ; V. Guyader ; Y. Bieron ; J. Galvier ; S. Nicoleau
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533